Dependence of the Generation Behavior of Charged Nanoparticles and Ag Film Growth on Sputtering Power during DC Magnetron Sputtering

Abstract Effects of sputtering power on the deposition rate and microstructure, crystallinity, electrical properties Ag films during direct current (DC) magnetron are investigated. Thin (~ 100 nm) deposited at powers 10, 20, 50, 100, 200 300 W analyzed by field-emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), transmission (TEM) a four-point probe. The film 10 has lowest growth rate, but highest crystalline quality, with full width half maximum (FWHM) resistivity. second best quality in view FWHM 50 moderate worst High-resolution TEM observations reveal that have far fewer defects, such as grain boundaries, dislocations stacking faults than those W. Such behavior could be explained power, which affected generation charged nanoparticles. And high obtained charge plays an important role. Graphic